Model of point-of-use plasma abatement of perfluorinated compounds with an inductively coupled plasma
- 1 July 1999
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 86 (1) , 152-162
- https://doi.org/10.1063/1.370711
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
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