All Refractory Josephson Integration Process with NbN Junctions
- 1 January 1986
- book chapter
- Published by Springer Nature
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Fabrication and performance of all refractory josephson logic circuits for 1 Kbit SFQ memoryIEEE Transactions on Magnetics, 1985
- An integration of all refractory Josephson logic LSI circuitIEEE Transactions on Magnetics, 1985
- Josephson tunnel junctions with refractory electrodesIEEE Transactions on Magnetics, 1985
- High speed logic operations of all refractory Josephson integrated circuitsApplied Physics Letters, 1983
- All refractory Josephson tunnel junctions fabricated by reactive ion etchingIEEE Transactions on Magnetics, 1983
- All-refractory Josephson logic circuitsIEEE Journal of Solid-State Circuits, 1983
- High quality refractory Josephson tunnel junctions utilizing thin aluminum layersApplied Physics Letters, 1983
- New fabrication process for Josephson tunnel junctions with (niobium nitride, niobium) double-layered electrodesApplied Physics Letters, 1982
- Selective niobium anodization process for fabricating Josephson tunnel junctionsApplied Physics Letters, 1981
- Planarization of Phosphorus‐Doped Silicon DioxideJournal of the Electrochemical Society, 1981