Drain-engineered hot-electron-resistant device structures: a review
- 1 June 1989
- journal article
- review article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 36 (6) , 1125-1132
- https://doi.org/10.1109/16.24357
Abstract
No abstract availableThis publication has 19 references indexed in Scilit:
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