New extended point defect structure in diamond cubic crystals
- 7 March 1994
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 72 (10) , 1494-1497
- https://doi.org/10.1103/physrevlett.72.1494
Abstract
In the course of atomistic simulations of the dislocation array at the Ge/Si(001) interface, we have generated a new closed symmetric defect structure comprising eighteen atoms that may be found in a variety of circumstances including dislocation intersections and grain boundaries. The structure maintains tetrahedral bonding with reasonable changes in bond lengths and angles, and may have interesting electronic properties. At the Ge/Si interface, these extended point defects may reach a very high planar concentration of ∼/.
Keywords
This publication has 14 references indexed in Scilit:
- Ge segregation at Si-Ge (001) stepped surfacesPhysical Review B, 1993
- Atomic and electronic structures of the 90° partial dislocation in siliconPhysical Review Letters, 1992
- Atomic structure of dislocations in silicon, germanium and diamondPhilosophical Magazine A, 1990
- Atomic Structure and Chemistry of Si/Ge Interfaces Determined by Z-Contrast StemMRS Proceedings, 1989
- Atomic structure of dislocations and dipoles in siliconPhilosophical Magazine A, 1987
- Electronic and Structural Properties of a Twin Boundary in SiPhysical Review Letters, 1986
- Computer simulation of local order in condensed phases of siliconPhysical Review B, 1985
- Theoretical study of the electronic structure of a high-angle tilt grain boundary in SiPhysical Review B, 1984
- New-Bonded Chain Model for Si(111)-(2×1) SurfacePhysical Review Letters, 1981
- Dislocations in the diamond latticeJournal of Physics and Chemistry of Solids, 1958