Fast deposition of microcrystalline silicon films with preferred (220) crystallographic texture using the high-density microwave plasma
- 1 October 2002
- journal article
- Published by Elsevier in Solar Energy Materials and Solar Cells
- Vol. 74 (1-4) , 505-511
- https://doi.org/10.1016/s0927-0248(02)00066-1
Abstract
No abstract availableKeywords
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