Low temperature formation of microcrystalline silicon films using high-density SiH4 microwave plasma
- 1 May 2001
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 386 (2) , 261-266
- https://doi.org/10.1016/s0040-6090(00)01678-3
Abstract
No abstract availableKeywords
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