A pulsed inductively coupled plasma source for plasma-based ion implantation
- 30 September 1997
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 93 (2-3) , 203-208
- https://doi.org/10.1016/s0257-8972(97)00045-5
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
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