Multiple imprinting in UV-based nanoimprint lithography: related material issues
- 31 July 2002
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 61-62, 407-413
- https://doi.org/10.1016/s0167-9317(02)00470-7
Abstract
No abstract availableKeywords
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- Step and flash imprint lithography: a new approach to high-resolution patterningPublished by SPIE-Intl Soc Optical Eng ,1999
- Nanoimprint lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- Imprint of sub-25 nm vias and trenches in polymersApplied Physics Letters, 1995