Dissociation mechanism of chlorosilane to silicon in low pressure microwave plasmas of argon and argon with hydrogen mixtures
- 1 September 1983
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 107 (3) , 235-244
- https://doi.org/10.1016/0040-6090(83)90402-9
Abstract
No abstract availableKeywords
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