Nanostructured Silicon thin films Deposited by PECVD in the Presence of Silicon Nanoparticles
- 1 January 1997
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Experimental evidence for nanoparticle deposition in continuous argon–silane plasmas: Effects of silicon nanoparticles on film propertiesJournal of Vacuum Science & Technology A, 1996
- Overview of growth and behaviour of clusters and particles in plasmasPlasma Sources Science and Technology, 1994
- Effects of plasma processing on the microstructural properties of silicon powdersPlasma Sources Science and Technology, 1994
- The structure and properties of nanosize crystalline silicon filmsJournal of Applied Physics, 1994
- Negative ion mass spectra and particulate formation in radio frequency silane plasma deposition experimentsApplied Physics Letters, 1993
- Measurements of particle size kinetics from nanometer to micrometer scale in a low-pressure argon-silane radio-frequency dischargeApplied Physics Letters, 1992
- Preparation and melting of amorphous silicon by molecular-dynamics simulationsPhysical Review B, 1988
- Particle Distributions and Laser-Particle Interactions in an RF Discharge of SilaneIEEE Transactions on Plasma Science, 1986
- Plasma polymerization and deposition of amorphous hydrogenated silicon from rf and dc silane plasmasJournal of Applied Physics, 1984
- A thermodynamic criterion of the crystalline-to-amorphous transition in siliconPhilosophical Magazine Part B, 1982