Low‐energy implantation and sputtering of TiO2 by nitrogen and argon and the electrochemical reoxidation
- 15 September 1991
- journal article
- Published by Wiley in Surface and Interface Analysis
- Vol. 17 (10) , 726-736
- https://doi.org/10.1002/sia.740171007
Abstract
No abstract availableKeywords
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