Titanium disilicide formation by interdiffusion of titanium/amorphous silicon multilayers: Influence of the bilayer silicon to titanium thickness ratio on the film properties
- 15 November 1992
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 72 (10) , 4660-4668
- https://doi.org/10.1063/1.352122
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
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