Strippable aqueous base developable negative photoresist for high aspect ratio micromachining
- 31 July 2002
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 61-62, 729-735
- https://doi.org/10.1016/s0167-9317(02)00481-1
Abstract
No abstract availableKeywords
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