Measurement of range distributions of zinc and nitrogen ions in multiple-layer substrates with the secondary ion microprobe
- 16 January 1979
- journal article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 51 (1) , 87-92
- https://doi.org/10.1002/pssa.2210510109
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- Concentration profiles of implanted boron ions in silicon from measurements with the ion microprobePhysica Status Solidi (a), 1973
- Properties of silicon implanted with boron ions through thermal silicon dioxideSolid-State Electronics, 1973
- Range Distribution Theory Based on Energy Distribution of Implanted IonsJournal of Applied Physics, 1972
- Analyses de couches minces de silice par emission ionique secondaireMaterials Research Bulletin, 1971
- Ranges of projectiles in amorphous materialsCanadian Journal of Physics, 1968
- Ion implantation in semiconductors—Part I: Range distribution theory and experimentsProceedings of the IEEE, 1968