Physical and chemical etching in plasmas
- 1 December 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 86 (2-3) , 101-116
- https://doi.org/10.1016/0040-6090(81)90280-7
Abstract
No abstract availableThis publication has 34 references indexed in Scilit:
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