Plasma reactor design for the selective etching of SiO2 on Si

This publication has 4 references indexed in Scilit:

• Control of relative etch rates of SiO2 and Si in plasma etching
  Solid-State Electronics, 1975
• 半導体集積回路製造工程へのガスプラズマの応用
  Denki Kagaku oyobi Kogyo Butsuri Kagaku, 1973
• Etching Characteristics of Silicon and its Compounds by Gas Plasma
  Japanese Journal of Applied Physics, 1973
• The effect of electro-negative gases on the work function of a metal
  Surface Science, 1964