Properties of silicon nitride films produced by r.f. plasma-activated chemical vapor deposition
- 1 March 1977
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 41 (3) , L57-L60
- https://doi.org/10.1016/0040-6090(77)90326-1
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
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