Silicon stencil masks for masked ion beam lithography proximity printing
- 31 January 1996
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 30 (1-4) , 257-260
- https://doi.org/10.1016/0167-9317(95)00240-5
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- MEMS fabrication by Lithography and Reactive Ion Etching (LIRIE)Microelectronic Engineering, 1995
- Silicon microsystemsMicroelectronic Engineering, 1993
- Silicon stencil masks for lithography below 0.25 μm by ion-projection exposureJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1992
- Magnetically enhanced triode etching of large area silicon membranes in a molecular bromine plasmaJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1992