Direct growth of nanostructures by deposition through an Si3N4 shadow mask
- 1 July 1999
- journal article
- Published by Elsevier in Physica E: Low-dimensional Systems and Nanostructures
- Vol. 4 (3) , 196-200
- https://doi.org/10.1016/s1386-9477(99)00007-7
Abstract
No abstract availableKeywords
This publication has 18 references indexed in Scilit:
- Large-area achromatic interferometric lithography for 100 nm period gratings and gridsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- 100 years of x rays: Impact on micro- and nanofabricationJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1995
- Field emitter array mask patterning using laser interference lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1995
- Single-domain magnetic pillar array of 35 nm diameter and 65 Gbits/in.2 density for ultrahigh density quantum magnetic storageJournal of Applied Physics, 1994
- Study of nanoscale magnetic structures fabricated using electron-beam lithography and quantum magnetic diskJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1994
- Fabrication of Si nanostructures with an atomic force microscopeApplied Physics Letters, 1994
- Confinement of Electrons to Quantum Corrals on a Metal SurfaceScience, 1993
- Investigating atomic-scale structures generated with the STMUltramicroscopy, 1992
- I n s i t u grown-in selective contacts to n-i-p-i doping superlattice crystals using molecular beam epitaxial growth through a shadow maskApplied Physics Letters, 1986
- Growth of three-dimensional dielectric waveguides for integrated optics by molecular-beam-epitaxy methodApplied Physics Letters, 1972