Poisson modeling of ultraconfined AlGaAs-GaAs semiconductor devices with selective doping
- 1 March 1990
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Electron Devices
- Vol. 37 (3) , 821-823
- https://doi.org/10.1109/16.47797
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
- Fabrication of a GaAs quantum-well-wire structure by Ga focused-ion-beam implantation and its optical propertiesPhysical Review B, 1988
- One-dimensional GaAs wires fabricated by focused ion beam implantationApplied Physics Letters, 1987
- Performance of the focused-ion-striped transistor (FIST)—A new MESFET structure produced by focused-ion-beam implantationIEEE Transactions on Electron Devices, 1987
- Electron states in narrow gate-induced channels in SiApplied Physics Letters, 1986
- Semi-classical calculation of charge distributions in ultra-narrow inversion linesIEEE Electron Device Letters, 1986
- Surface superlattice formation in silicon inversion layers using 0.2-µm period grating-gate electrodesIEEE Electron Device Letters, 1985
- Monte Carlo simulation of ion beam penetration in solidsRadiation Effects, 1982
- An analytical approximation for the Fermi-Dirac integralSolid-State Electronics, 1981