In-Situ Dual-Wavelength Ellipsometry and Light Scattering Monitoring of Si/Si1−xGex Heterostructures and Multiuantum Wells
- 1 January 1993
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- In-situ dual-wavelength and ex-situ spectroscopic ellipsometry studies of strained SiGe epitaxial layers and multi-quantum well structuresThin Solid Films, 1993
- RHEED investigation of Ge surface segregation during gas source MBE of
Si Si Surface Science, 1993 - Correlation of in situ ellipsometric and light scattering data of silicon-based materials with post-deposition diagnosticsThin Solid Films, 1991
- A model for heterogeneous growth of Si1−xGex films from hydridesJournal of Applied Physics, 1991
- Infrared and ellipsometric studies of amorphous hydrogenated carbon filmsJournal of Applied Physics, 1991