Electron beam induced selective etching and deposition technology
- 1 January 1990
- journal article
- Published by Elsevier in Superlattices and Microstructures
- Vol. 7 (4) , 295-301
- https://doi.org/10.1016/0749-6036(90)90213-q
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Direct writing of 10 nm features with the scanning tunneling microscopeApplied Physics Letters, 1988
- I n s i t u observation on electron beam induced chemical vapor deposition by transmission electron microscopyJournal of Vacuum Science & Technology B, 1988
- Si deposition by electron beam induced surface reactionApplied Physics Letters, 1988
- I n s i t u observation on electron-beam-induced chemical vapor deposition by transmission electron microscopyApplied Physics Letters, 1988
- Direct writing onto Si by electron beam stimulated etchingApplied Physics Letters, 1987
- I n s i t u observation on electron beam induced chemical vapor deposition by Auger electron spectroscopyApplied Physics Letters, 1987
- New selective deposition technology by electron-beam induced surface reactionJournal of Vacuum Science & Technology B, 1986
- Photodeposition of metal films with ultraviolet laser lightJournal of Vacuum Science and Technology, 1982
- Ion- and electron-assisted gas-surface chemistry—An important effect in plasma etchingJournal of Applied Physics, 1979
- Electron-beam fabrication of 80-Å metal structuresApplied Physics Letters, 1976