Electrical and structural properties of Ga0.51In0.49P/GaAs heterojunctions grown by metalorganic vapor-phase epitaxy

Abstract
Undoped and Se‐doped Ga0.51In0.49P/GaAs single heterojunctions grown by metalorganic vapor‐phase epitaxy (MOVPE) are characterized with deep‐level transient spectroscopy and transmission electron microscopy (TEM). The undoped MOVPE material, grown at 710 °C, is characterized by a deep electron trap with an activation energy that takes values in the range 700–900 meV. Se doping suppresses the formation of this trap when the doping level is higher than 5×1017 cm−3. Furthermore, Se doping suppresses the persistent photoconductivity that is observed in the undoped samples. Finally, analysis with cross‐section TEM reveals that the samples undergo partial spinodal decomposition in a direction nearly vertical to the interface.