Reactions between Ti and Al films on a-Si:H
- 31 August 1986
- journal article
- Published by Elsevier in Materials Letters
- Vol. 4 (8-9) , 350-352
- https://doi.org/10.1016/0167-577x(86)90067-4
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Atomic Migration of Metals in the Interfaces of Au-Si and Ni-Si for Crystalline and Amorphous Si Observed by 40 MeV-O5+ Ion BackscatteringJapanese Journal of Applied Physics, 1985
- Reaction between Hydrogenated Amorphous Silicon and Aluminum FilmTransactions of the Japan Institute of Metals, 1984
- Interaction between n-type amorphous hydrogenated silicon films and metal electrodesJournal of Applied Physics, 1982
- Ti and V layers retard interaction between Al films and polycrystalline SiApplied Physics Letters, 1976
- Characteristics of aluminum-titanium electrical contacts on siliconApplied Physics Letters, 1973