Plasma-assisted chemical vapour deposition of TiN and TiC on steel: Properties of coatings
- 1 November 1988
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 165 (1) , 139-148
- https://doi.org/10.1016/0040-6090(88)90685-2
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Evaluation of adhesion strength of thin hard coatingsThin Solid Films, 1987
- Deposition of TiN and Ti(O,C,N) hard coatings by a plasma assisted chemical vapor deposition processJournal of Vacuum Science & Technology A, 1986
- Composition, morphology and mechanical properties of plasma-assisted chemically vapor-deposited TiN films on M2 tool steelThin Solid Films, 1986
- Very high rate reactive sputtering of TiN, ZrN and HfNThin Solid Films, 1983
- Processes of the activated reactive evaporation type and their tribological applicationsThin Solid Films, 1983
- Mechanisms of reactive sputtering of titanium nitride and titanium carbide III: Influence of substrate bias on composition and structureThin Solid Films, 1983
- Mechanisms of reactive sputtering of titanium nitride and titanium carbide II: Morphology and structureThin Solid Films, 1983
- Mechanisms of reactive sputtering of titanium nitride and titanium carbide I: Influence of process parameters on film compositionThin Solid Films, 1983
- The plasma-assisted chemical vapour deposition of TiC, TiN and TiCxN1−xThin Solid Films, 1981
- Carbide coating process by use of molten borax bath in JapanJournal of Heat Treating, 1979