Investigation of formation processes of an anodic porous alumina film on a silicon substrate
- 13 August 2004
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 237 (1-4) , 369-373
- https://doi.org/10.1016/j.apsusc.2004.06.066
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Transfer of nanoporous pattern of anodic porous alumina into Si substrateApplied Physics Letters, 2003
- Evaluation of pore diameter of anodic porous films formed on aluminumSurface and Coatings Technology, 2003
- Formation and Microstructures of Anodic Alumina Films from Aluminum Sputtered on Glass SubstrateJournal of the Electrochemical Society, 2002
- Ideally Ordered Anodic Porous Alumina Mask Prepared by Imprinting of Vacuum-Evaporated Al on SiJapanese Journal of Applied Physics, 2001
- Fabrication of nanohole array on Si using self-organized porous alumina maskJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2001
- 100 nm period silicon antireflection structures fabricated using a porous alumina membrane maskApplied Physics Letters, 2001
- Self-ordered pore structure of anodized aluminum on silicon and pattern transferApplied Physics Letters, 2000
- Highly-ordered carbon nanotube arrays for electronics applicationsApplied Physics Letters, 1999
- Dehydroxylation of Aluminum (Oxo)Hydroxides Using Infrared Emission Spectroscopy. Part II: BoehmiteApplied Spectroscopy, 1999
- Ordered Metal Nanohole Arrays Made by a Two-Step Replication of Honeycomb Structures of Anodic AluminaScience, 1995