A new deposition parameter to control the carrier drift mobility in a-Si:H
- 1 May 1996
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 198-200, 1003-1006
- https://doi.org/10.1016/0022-3093(96)00022-1
Abstract
No abstract availableKeywords
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