Plasma-enhanced chemical vapor deposition of molybdenum
- 2 March 1987
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 147 (2) , 193-202
- https://doi.org/10.1016/0040-6090(87)90284-7
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Formation of WxSi1−x by plasma chemical vapor depositionApplied Physics Letters, 1981
- The Deposition of Molybdenum and Tungsten Films from Vapor Decomposition of CarbonylsJournal of the Electrochemical Society, 1970
- Chemical Deposition of Mo on SiJapanese Journal of Applied Physics, 1968