Characteristics of a Modified High Frequency Ion Source
- 1 September 1981
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 20 (9)
- https://doi.org/10.1143/jjap.20.1771
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Magnetic sector atom-probe field ion microscope with a retarding potential analyzerJournal of Vacuum Science and Technology, 1978
- Germanium and Silicon Film Growth by Low-Energy Ion Beam DepositionJapanese Journal of Applied Physics, 1977
- Energy Distribution of Positive Ions Extracted from anRFPlasmaJournal of the Physics Society Japan, 1969
- Excess Energy Measurement of Ion Beam from High Frequency Ion SourceJapanese Journal of Applied Physics, 1966