Submicrometer-resolution etching of integrated circuit materials with laser-generated atomic fluorine
- 1 November 1985
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 58 (9) , 3649-3651
- https://doi.org/10.1063/1.335748
Abstract
We have demonstrated submicrometer-resolution lithography by ultraviolet laser-induced radical etching. We previously showed that this method can provide highly specific and efficient etching of various refractory metal/insulator and semiconductor/insulator substrate combinations.This publication has 11 references indexed in Scilit:
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