Effects of Monolayer Adsorption and Bombardment Damage on Auger Electron Ejection from Germanium
- 1 June 1961
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 32 (6) , 1015-1019
- https://doi.org/10.1063/1.1736151
Abstract
Data are presented which show how the adsorption of carbon monoxide and oxygen on atomically clean germanium affect the process of Auger neutralization of He+ and Ne+ at the surface. Measurements of both total yield and kinetic‐energy distribution of ejected Auger electrons have been made. The effect of ion bombardment alone without subsequent anneal, including the presence of absorbed noble gas in the surface layers of the crystal, has been investigated. Photomicrographs of the germanium target surface are reproduced.This publication has 7 references indexed in Scilit:
- Oxygen Adsorption on Silicon and GermaniumJournal of Applied Physics, 1961
- Theory of Auger Neutralization of Ions at the Surface of a Diamond-Type SemiconductorPhysical Review B, 1961
- Auger Electron Ejection from Germanium and Silicon by Noble Gas IonsPhysical Review B, 1960
- Studies of auger electrons ejected from germanium by slowly moving positive ionsJournal of Physics and Chemistry of Solids, 1960
- Cleaning of Silicon Surfaces by Heating in High VacuumJournal of Applied Physics, 1959
- Application of the Ion Bombardment Cleaning Method to Titanium, Germanium, Silicon, and Nickel as Determined by Low-Energy Electron DiffractionJournal of Applied Physics, 1958
- Effect of Monolayer Adsorption on the Ejection of Electrons from Metals by IonsPhysical Review B, 1956