Optical emission end point detection for reactive ion etching of Si/SiGe structures
- 31 October 1994
- journal article
- Published by Elsevier in Materials Science and Engineering: B
- Vol. 27 (1) , 39-45
- https://doi.org/10.1016/0921-5107(94)90151-1
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
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