SiO2 deposition by direct photolysis at 185 nm of N2O and SiH4
- 1 December 1990
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 46 (1-4) , 189-194
- https://doi.org/10.1016/0169-4332(90)90140-u
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
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