Large critical current densities in YBa2Cu3O7-x thin films formed by plasma-enhanced metalorganic chemical vapor deposition at reduced temperature
- 1 April 1991
- journal article
- Published by Springer Nature in Journal of Electronic Materials
- Vol. 20 (4) , 341-343
- https://doi.org/10.1007/bf02657903
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- Deposition of high-Tc superconducting Y-Ba-Cu-O thin films at low temperatures using a plasma-enhanced organometallic chemical vapor deposition approachSolid State Communications, 1990
- Epitaxial growth and properties of YBaCuO thin filmsMaterials Science Reports, 1989
- Y-Ba-Cu-O Film Growth by OMCVD Using N2OJapanese Journal of Applied Physics, 1989
- High critical-current density of Y-Ba-Cu-O superconducting films prepared by CVDSuperconductor Science and Technology, 1989
- Role of atomic oxygen in the low-temperature growth of YBa2Cu3O7−δ thin films by laser ablation depositionApplied Physics Letters, 1989
- High critical currents in epitaxial YBa2Cu3O7−x thin films on silicon with buffer layersApplied Physics Letters, 1989
- Organometallic chemical vapor deposition of high T c superconducting films using a volatile, fluorocarbon-based precursorApplied Physics Letters, 1988
- Y-Ba-Cu-O superconducting films prepared on SrTiO3 substrates by chemical vapor depositionApplied Physics Letters, 1988
- Processing Techniques for the 93 K Superconductor Ba 2 YCu 3 O 7Science, 1988
- Formation of high T c superconducting films by organometallic chemical vapor depositionApplied Physics Letters, 1988