In situ cleaning of Si surfaces by UV/ozone
- 2 February 1993
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 127 (1-4) , 476-478
- https://doi.org/10.1016/0022-0248(93)90664-i
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Vapor phase hydrocarbon removal for Si processingApplied Physics Letters, 1990
- Low Temperature Silicon Surface Cleaning by HF Etching/Ultraviolet Ozone Cleaning (HF/UVOC) Method (I) –Optimization of the HF Treatment–Japanese Journal of Applied Physics, 1989
- Low Temperature Surface Cleaning of Silicon and Its Application to Silicon MBEJournal of the Electrochemical Society, 1986
- Carbide Contamination of Silicon SurfacesJournal of Applied Physics, 1971