Homogeneous hydrogen-terminated Si(111) surface formed using aqueous HF solution and water
- 16 September 1991
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 59 (12) , 1458-1460
- https://doi.org/10.1063/1.105287
Abstract
Aqueous HF etching of silicon surface removes surface oxide, leaving a silicon surface terminated by atomic hydrogen. We studied the effect of the immersion in water, following HF etching, on the surface hydride structure and flatness, by measuring Si-H stretching vibration using infrared absorption spectroscopy. Immersion at 20 °C flattens the Si(111) surface, which is atomically rough just after etching, to some extent. Boiling water (100 °C) produces an atomically flat surface homogeneously covered with silicon monohydride (—SiH) normal to the surface and free of oxidation. The surface has a low defect density of less than 0.5%.Keywords
This publication has 8 references indexed in Scilit:
- Control of the chemical reactivity of a silicon single-crystal surface using the chemical modification techniqueJournal of Applied Physics, 1990
- Ideal hydrogen termination of the Si (111) surfaceApplied Physics Letters, 1990
- Effects of surface hydrogen on the air oxidation at room temperature of HF-treated Si (100) surfacesApplied Physics Letters, 1990
- Infrared spectroscopy of Si(111) and Si(100) surfaces after HF treatment: Hydrogen termination and surface morphologyJournal of Vacuum Science & Technology A, 1989
- Initial Oxidation Process of Anodized Porous Silicon with Hydrogen Atoms Chemisorbed on the Inner SurfaceJapanese Journal of Applied Physics, 1988
- Unusually Low Surface-Recombination Velocity on Silicon and Germanium SurfacesPhysical Review Letters, 1986
- Investigations on hydrophilic and hydrophobic silicon (100) wafer surfaces by X-ray photoelectron and high-resolution electron energy loss-spectroscopyApplied Physics A, 1986
- Formation of SiH bonds on the surface of microcrystalline silicon covered with SiOx by HF treatmentSolid State Communications, 1984