Ion-Enhanced Chemical Reaction of XeF2 with Silicon by Modulated Molecular Beam Mass Spectrometry
- 1 January 1984
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- The chemical sputtering of silica by Ar+ ions and XeF2Surface Science, 1984
- Plasma-assisted etchingPlasma Chemistry and Plasma Processing, 1982
- Ion- and electron-assisted gas-surface chemistry—An important effect in plasma etchingJournal of Applied Physics, 1979
- Investigation of Gas–Solid Reactions by Modulated Molecular Beam Mass SpectrometryJournal of Vacuum Science and Technology, 1972
- Velocity Dispersion of Square-Modulated Maxwellian Molecular Beams : The Integral Fn(x)= ∫ ∞znexp(−z2)dzThe Journal of Chemical Physics, 1964