Quantum interferometric optical lithography:towards arbitrary two-dimensional patterns

Preprint

9 May 2001

preprint
Published by arXiv in arXiv

https://doi.org/10.48550/arXiv.quant-ph/0011088

Abstract

As demonstrated by Boto et al. [Phys. Rev. Lett. 85, 2733 (2000)], quantum lithography offers an increase in resolution below the diffraction limit. Here, we generalize this procedure in order to create patterns in one and two dimensions. This renders quantum lithography a potentially useful tool in nanotechnology.

Keywords

QUANTUM INTERFEROMETRIC
INTERFEROMETRIC OPTICAL
DIMENSIONAL PATTERNS
QUANTUM LITHOGRAPHY
OPTICAL LITHOGRAPHY
NANOTECHNOLOGY
ARBITRARY TWO
DIFFRACTION

All Related Versions

Version 1, 2000-11-21, ArXiv
Version 2, 2001-05-09, ArXiv
Published version: Physical Review A, 63 (6), 063407.

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