Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns
- 9 May 2001
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review A
- Vol. 63 (6) , 063407
- https://doi.org/10.1103/physreva.63.063407
Abstract
As demonstrated by Boto et al. [Phys. Rev. Lett. 85, 2733 (2000)], quantum lithography offers an increase in resolution below the diffraction limit. Here, we generalize this procedure in order to create patterns in one and two dimensions. This renders quantum lithography a potentially useful tool in nanotechnology.Keywords
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