Interferometric lithography — from periodic arrays to arbitrary patterns
- 31 March 1998
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 41-42, 145-148
- https://doi.org/10.1016/s0167-9317(98)00032-x
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Interferometric lithography of sub-micrometer sparse hole arrays for field-emission display applicationsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1996
- Field emitter array mask patterning using laser interference lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1995
- Multiple-exposure interferometric lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1993
- Holographic lithography with thick photoresistApplied Physics Letters, 1983