Characteristic erosion of silica by oblique argon ion beam bombardment
- 2 March 1987
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 147 (2) , 153-165
- https://doi.org/10.1016/0040-6090(87)90281-1
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Geometrical factors of argon incorporation in SiO2 films deposited by ion beam sputteringThin Solid Films, 1984
- Heavy ion sputtering induced surface topography developmentPublished by Springer Nature ,1983
- Internal stresses in Cr, Mo, Ta, and Pt films deposited by sputtering from a planar magnetron sourceJournal of Vacuum Science and Technology, 1982
- The mechanisms of etch pit and ripple structure formation on ion bombarded Si and other amorphous solidsNuclear Instruments and Methods, 1980
- The growth of topography during sputtering of amorphous solidsJournal of Materials Science, 1973
- Prediction of ion-bombarded surface topographies using Frank's kinematic theory of crystal dissolutionJournal of Materials Science, 1973
- Secondary processes in the evolution of sputter-topographiesJournal of Materials Science, 1972
- Application of ion sputtering in preparing glasses and their surface layers for electron microscope investigationsJournal of Non-Crystalline Solids, 1970