The mechanisms of etch pit and ripple structure formation on ion bombarded Si and other amorphous solids
- 1 March 1980
- journal article
- Published by Elsevier in Nuclear Instruments and Methods
- Vol. 170 (1-3) , 363-369
- https://doi.org/10.1016/0029-554x(80)91041-1
Abstract
No abstract availableKeywords
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