Mass spectrometric investigations of background gases during the sputtering of tantalum
- 30 November 1973
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 18 (2) , 309-319
- https://doi.org/10.1016/0040-6090(73)90109-0
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- A kinetic study of the initial oxidation of a Ta(110) surface using oxygen kα X-ray emissionSurface Science, 1972
- Tantalum Films Triode Sputtered in Low-Pressure Mixtures of Argon and Water VaporJournal of Vacuum Science and Technology, 1972
- Reactivity sputtered tantalum thin film resistors Part 1. Physical and electrical propertiesThin Solid Films, 1971
- Phase composition and conductivity of sputtered tantalumThin Solid Films, 1970
- Tables of Uncertified Mass Spectra of Diffusion Pump OilsJournal of Vacuum Science and Technology, 1969
- A high current vacuum discharge for triode-sputtering in the 10−4 torr rangeVacuum, 1967
- Role of Hydrogen in the Sputtering of Nickel–Chromium FilmsJournal of Vacuum Science and Technology, 1967
- Mass Spectrometry of Background Gases in Glow-Discharge Sputtering of Tantalum Thin FilmsJournal of Vacuum Science and Technology, 1967
- Prevention of Oxidation in a Glow Discharge Environment with Sputtered Permalloy Films as an ExampleJournal of the Electrochemical Society, 1965