Direct Pattern Fabrication of Substituted Phthalocyanine Films
- 1 September 1985
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 24 (9A) , L685-686
- https://doi.org/10.1143/jjap.24.l685
Abstract
A new technique for high resolution lithography of phthalocyanine molecules is described. The phthalocyanine substituted with long chain alkyl amide groups was found to show good solubility in chloroform and the phthalocyanine films show good sensitivity to electron beams (Dn0.5=6.8 µC/cm2), with a contrast value of γ=1.6, and with semiconductivities (-6 S/cm).This publication has 4 references indexed in Scilit:
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