The conduction properties of Plasma-Enhanced Low-Pressure Chemical Vapour Deposited (PELPCVD) SIPOS
- 28 February 1989
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 32 (2) , 131-135
- https://doi.org/10.1016/0038-1101(89)90179-2
Abstract
No abstract availableKeywords
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