Reactive unbalanced magnetron sputter deposition of polycrystalline TiN/NbN superlattice coatings
- 1 April 1993
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 57 (1) , 13-18
- https://doi.org/10.1016/0257-8972(93)90331-h
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
- Deposition and properties of polycrystalline TiN/NbN superlattice coatingsJournal of Vacuum Science & Technology A, 1992
- Elastic properties of TiN/(VxNb1−x)N superlattices measured by Brillouin scatteringJournal of Applied Physics, 1992
- Growth, structure, and microhardness of epitaxial TiN/NbN superlatticesJournal of Materials Research, 1992
- Enhanced hardness in lattice-matched single-crystal TiN/V0.6Nb0.4N superlatticesApplied Physics Letters, 1990
- High rate reactive sputtering in an opposed cathode closed-field unbalanced magnetron sputtering systemSurface and Coatings Technology, 1990
- The effect of target power on the nitrogen partial pressure level and hardness of reactively sputtered titanium nitride coatingsThin Solid Films, 1989
- High rate reactive sputtering process controlSurface and Coatings Technology, 1987
- Growth of single-crystal TiN/VN strained-layer superlattices with extremely high mechanical hardnessJournal of Applied Physics, 1987
- Cross‐Section preparation for tem of film‐substrate combinations with a large difference in sputtering yieldsJournal of Electron Microscopy Technique, 1986
- Growth and properties of single crystal TiN films deposited by reactive magnetron sputteringJournal of Vacuum Science & Technology A, 1985