Two- and three-body quenching of XeF* by Ar and Xe
- 1 May 1977
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 30 (9) , 458-460
- https://doi.org/10.1063/1.89440
Abstract
In this paper we report two‐ and three‐body quenching of the XeF* (B2Σ+1/2) state by Ar and Xe. The rate constants were obtained by analyzing the dependence of (B2Σ+1/2 →X2Σ+1/2) radiation on the partial pressures of Ar, Xe, and F2. The XeF* was produced by a high‐energy e‐beam. We have determined the two‐ and three‐body quenching rates by Ar to be 8±4×10−13 cm3/sec and 1.5±0.5×10−32 cm6/sec. Xe quenches XeF* with a three‐body rate constant of 3±1.5 ×10−31 cm6/sec; the third body was mainly argon.Keywords
This publication has 14 references indexed in Scilit:
- Quenching rate constants for metastable argon, krypton, and xenon atoms by fluorine containing molecules and branching ratios for XeF* and KrF* formationThe Journal of Chemical Physics, 1976
- Electron-beam-controlled discharge pumping of the XeF laserApplied Physics Letters, 1976
- Modeling the KrF laser dischargeApplied Physics Letters, 1976
- Attachment-dominated electron-beam-ionized dischargesApplied Physics Letters, 1976
- High-efficiency KrF excimer laserApplied Physics Letters, 1976
- Electron-beam-controlled discharge pumping of the KrF laserApplied Physics Letters, 1975
- 354-nm laser action on XeFApplied Physics Letters, 1975
- Laser action on the 2Σ+1/2→2Σ+1/2 bands of KrF and XeClApplied Physics Letters, 1975
- Stimulated emission at 281.8 nm from XeBrApplied Physics Letters, 1975
- Saturation Effects in High-Gain LasersJournal of Applied Physics, 1965