Amorphous silicon produced by ion implantation: Effects of ion mass and thermal annealing
- 15 June 1984
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 55 (12) , 4361-4366
- https://doi.org/10.1063/1.333004
Abstract
No abstract availableThis publication has 16 references indexed in Scilit:
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