Epitaxial Layer Thickness Measurement by Far Infrared Ellipsometry
- 1 November 1972
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 11 (11) , 2534-2539
- https://doi.org/10.1364/ao.11.002534
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.Keywords
This publication has 10 references indexed in Scilit:
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- Measurement of Epitaxial Film Thickness Using an Infrared EllipsometerJournal of the Electrochemical Society, 1966
- Determination of the Properties of Films on Silicon by the Method of EllipsometryJournal of the Optical Society of America, 1962
- Theoretical Treatment of EllipsometryJournal of the Optical Society of America, 1962
- Impurity Distribution in Epitaxial Silicon FilmsJournal of the Electrochemical Society, 1962
- Interference Method for Measuring the Thickness of Epitaxially Grown FilmsJournal of Applied Physics, 1961
- The Use of an Interference Microscope for Measurement of Extremely Thin Surface LayersBell System Technical Journal, 1956