Depth profile analysis of chemically amplified resist by using TOF-SIMS with gradient shaving preparations
- 25 May 2004
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 231-232, 353-356
- https://doi.org/10.1016/j.apsusc.2004.03.093
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Depth profile analysis of the photochemical degradation of polycarbonate by infrared spectroscopyPolymer Degradation and Stability, 2003
- Improvement in 193 nm Photoresists Performance by 172 nm VUV CuringJournal of Photopolymer Science and Technology, 2003
- Depth profile analysis of ion‐implanted photoresist by infrared spectroscopySurface and Interface Analysis, 2002